Focus on investment and development layout of semiconductor wet process equipment industry
Fully realize the domestic substitution of semiconductor wet process equipment
SPIN COMPOSITE MACHINE (SC SERIES)
Applications
Panel level packaging
Warpage
≤±7mm
Panel size
515*510mm,Square panels in various sizes
Process Specification
Uniformity:
WiW≤3%
WtW≤5%
CPK=1.67
Application of Wet Cleaning Processes
PI film developing PR film developing Copper etching Titanium etching
Features&configurations
1-4 chambers(Supporting customization)
2-4 FOUP(Supporting customization)
Chemicals(Ex):Cyclopentanone,PGMEA,TMAH,NaCO3,DICO2,Ti Etching solution,Cu Etching solution,H2SO4 and other back spray configurations are available for selection
Supporting chemical CCSS,LCSS
Heating control, concentration control, flow rate control, pressure control et al.
Separated exhaust for acid, base and organics
Chemical reclaim
Bath overheating protection,leakage detection, classified discharge
SECS/GEM communication