Focus on investment and development layout of semiconductor wet process equipment industry
Fully realize the domestic substitution of semiconductor wet process equipment
SINGLE WAFER CLEANER(SC3100 SERIES)
Applications
RCA cleaning,GATE cleaning,oxide etching and removal,photoresist stripping
Wafer size
300mm
Application of Wet Cleaning Processes
Particle removal
Metal contamination removal
Organic contamination removal
Photoresist stripping
Pre-cleaning and Post-cleaning
Oxide etching and removal
Al interconnect cleaning
Cu interconnect cleaning
Features&configurations
● WPH:300
● 8 chambers
● 4 FOUP
● Chemicals(Ex):DHF,SC1,SC2,DIO3,DICO2,IPA
● Backside Protection:Option,3ea nozzles
● Heating control,concentration control,flow rate control,pressure control et al.
● SECS/GEM communication